Hostname: page-component-848d4c4894-pftt2 Total loading time: 0 Render date: 2024-05-05T21:49:00.123Z Has data issue: false hasContentIssue false

Characterization of Damage in SiO2 during Helium Ion Microscope Observation by Luminescence and TEM-EELS

Published online by Cambridge University Press:  23 November 2012

S. Ogawa
Affiliation:
National Institute of Advanced Industrial Science & Technology (AIST), Tsukuba, Japan
T. Iijima
Affiliation:
National Institute of Advanced Industrial Science & Technology (AIST), Tsukuba, Japan
S. Awata
Affiliation:
HORIBA, Ltd., Kyoto, Japan
R. Sugie
Affiliation:
Toray Research Center Inc., Otsu, Japan
N. Kawasaki
Affiliation:
Toray Research Center Inc., Otsu, Japan
Y. Otsuka
Affiliation:
Toray Research Center Inc., Otsu, Japan
Get access

Abstract

Extended abstract of a paper presented at Microscopy and Microanalysis 2012 in Phoenix, Arizona, USA, July 29 – August 2, 2012.

Type
Research Article
Copyright
Copyright © Microscopy Society of America 2012

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)